Coherent spin transport through a 350-micron-thick Silicon wafer
arXiv:0706.0866 · doi:10.1103/PhysRevLett.99.177209
Abstract
We use all-electrical methods to inject, transport, and detect spin-polarized electrons vertically through a 350-micron-thick undoped single-crystal silicon wafer. Spin precession measurements in a perpendicular magnetic field at different accelerating electric fields reveal high spin coherence with at least 13pi precession angles. The magnetic-field spacing of precession extrema are used to determine the injector-to-detector electron transit time. These transit time values are associated with output magnetocurrent changes (from in-plane spin-valve measurements), which are proportional to final spin polarization. Fitting the results to a simple exponential spin-decay model yields a conduction electron spin lifetime (T1) lower bound in silicon of over 500ns at 60K.
Accepted in PRL
References in corpus (6)
- Electrical Detection of Spin Transport in Lateral Ferromagnet-Semiconductor Devices
- Electronic measurement and control of spin transport in Silicon
- Experimental realization of a silicon spin field-effect transistor
- Transit-Time Spin Field-Effect-Transistor
- 35% magnetocurrent with spin transport through Si
- Spin lifetime in silicon in the presence of parasitic electronic effects
Cited by in corpus (8)
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- Spin Dephasing in Drift-Dominated Semiconductor Spintronics Devices
- Oblique Hanle Effect in Semiconductor Spin Transport Devices
- Non-ohmic spin transport in n-type doped silicon
- Spin injection from Fe into Si(001): ab initio calculations and role of the Si complex band structure
- Theory of electrical spin-detection at a ferromagnet/semiconductor interface
- Optical orientation in bipolar spintronic devices