Observation of large spin accumulation voltages in non-degenerate Si spin devices due to spin drift effect: Experiments and theory
arXiv:1601.00759 · doi:10.1103/PhysRevB.93.214406
Abstract
A large spin-accumulation voltage of more than 1.5 mV at 1 mA, i.e., a magnetoresistance of 1.5 Ω, was measured by means of the local three-terminal magnetoresistance in nondegenerate Si-based lateral spin valves (LSVs) at room temperature. This is the largest spin-accumulation voltage measured in semiconductor-based LSVs. The modified spin drift-diffusion model, which successfully accounts for the spin drift effect, explains the large spin-accumulation voltage and significant bias-current-polarity dependence. The model also shows that the spin drift effect enhances the spin-dependent magnetoresistance in the electric two terminal scheme. This finding provides a useful guiding principle for spin metal-oxide semiconductor field-effect transistor (MOSFET) operations.
29 pages, 6 figures, 2 tables
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Cited by in corpus (12)
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- Quantitative and systematic analysis of bias dependence of spin accumulation voltage in a non-degenerate Si spin valve
- Over 1% magnetoresistance ratio at room temperature in non-degenerate silicon-based lateral spin valves
- Spin injection into silicon detected by broadband ferromagnetic resonance spectroscopy
- Investigation of spin scattering mechanism in silicon channels of Fe/MgO/Si lateral spin valves
- Investigation of gating effect in Si spin MOSFET
- Gate-tunable spin exclusive or operation in a silicon-based spin device at room temperature
- Spincaloritronic signal generation in non-degenerate Si
- Electric Field Modulation of Spin Transport
- On the origin of the giant spin detection efficiency in tunnel barrier based electrical spin detector