35% magnetocurrent with spin transport through Si
arXiv:0704.3949 · doi:10.1063/1.2767198
Abstract
Efficient injection of spin-polarized electrons into the conduction band of silicon is limited by the formation of a silicide at the ferromagnetic metal (FM)/silicon interface. In the present work, this "magnetically-dead" silicide (where strong spin-scattering significantly reduces injected spin polarization) is eliminated by moving the FM in the spin injector from the tunnel junction base anode to the emitter cathode and away from the silicon surface. This results in over an order-of-magnitude increase in spin injection efficiency, from a previously-reported magnetocurrent ratio of ~2% to ~35% and an estimated spin polarization in Si from ~1% to at least ~15%. The injector tunnel-junction bias dependence of this spin transport signal is also measured, demonstrating the importance of low bias voltage to preserve high injected spin polarization.
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Cited by in corpus (14)
- Semiconductor Spintronics
- Spin dynamics in semiconductors
- Coherent spin transport through a 350-micron-thick Silicon wafer
- Geometric dephasing-limited Hanle effect in long-distance lateral silicon spin transport devices
- Experimental realization of a silicon spin field-effect transistor
- Spin polarized electron transport near the Si/SiO2 interface
- Field-induced negative differential spin lifetime in silicon
- Non-ohmic spin transport in n-type doped silicon
- Room-temperature detection of spin accumulation in silicon across Schottky tunnel barriers using a MOSFET structure
- Spin injection from Fe into Si(001): ab initio calculations and role of the Si complex band structure
- Reverse Schottky-Asymmetry Spin Current Detectors
- Spin relaxation via exchange with donor impurity-bound electrons
- Simulation of the Spin Field Effect Transistors: Effects of Tunneling and Spin Relaxation on its Performance
- Modeling spin transport with current-sensing spin detectors