High Performance Single Layered WSe2 p-FETs with Chemically Doped Contacts

Abstract

We report high performance p-type field-effect transistors based on single layered (thickness, ~0.7 nm) WSe2 as the active channel with chemically doped source/drain contacts and high-κ gate dielectrics. The top-gated monolayer transistors exhibit a high effective hole mobility of ~250 cm2/Vs, perfect subthreshold swing of ~60 mV/dec, and ION/IOFF of >10^6 at room temperature. Special attention is given to lowering the contact resistance for hole injection by using high work function Pd contacts along with degenerate surface doping of the contacts by patterned NO2 chemisorption on WSe2. The results here present a promising material system and device architecture for p-type monolayer transistors with excellent characteristics.

References in corpus (3)

• Detection of Individual Gas Molecules Absorbed on Graphene
• From Graphene to Carbon Fibres: Mechanical Deformation and Development of a Universal Stress Sensor
• The Integration of High-k Dielectric on Two-Dimensional Crystals by Atomic Layer Deposition

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• Intervalley Scattering and Localization Behaviors of Spin-Valley Coupled Dirac Fermions