Edge Channel Transport in InAs/GaSb Topological Insulating Phase

Abstract

Transport in InAs/GaSb heterostructures with different InAs layer thicknesses is studied using a six-terminal Hall bar geometry with a 2-$\mu$m edge channel length. For a sample with a 12-nm-thick InAs layer, non-local resistance measurements with various current/voltage contact configurations reveal that the transport is dominated by edge channels with negligible bulk contribution. Systematic non-local measurements allow us to extract the resistance of individual edge channels, revealing sharp resistance uctuations indicative of inelastic scattering. Our results show that the InAs/GaSb system can be tailored to have conducting edge channels while keeping a gap in the bulk region and provide a way of studying 2D topological insulators even when quantized transport is absent.

6 pages, 6 figures

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• Generic helical edge states due to Rashba spin-orbit coupling in a topological insulator
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• Passivation of Edge States in Etched InAs Sidewalls
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