Passivation of Edge States in Etched InAs Sidewalls
arXiv:1706.01704 · doi:10.1063/1.4986614
Abstract
We investigate different methods of passivating sidewalls of wet etched InAs heterostructures in order to suppress inherent edge conduction that is presumed to occur due to band bending at the surface leading to charge carrier accumulation. Passivation techniques including sulfur, positively charged compensation dopants and plasma enhanced chemical vapor deposition of do not show an improvement. Surprisingly, atomic layer deposition of leads to an increase in edge resistivity of more than an order of magnitude. While the mechanism behind this change is not fully understood, possible reasons are suggested.
References in corpus (8)
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Cited by in corpus (8)
- High mobility InAs 2DEGs on GaSb substrates: a platform for mesoscopic quantum transport
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- Counterflowing edge current and its equilibration in quantum Hall devices with sharp edge potential: Roles of incompressible strips and contact configuration
- Gate-tunable Electronic Transport in p-type GaSb Quantum Wells
- Few-electron Single and Double Quantum Dots in an InAs Two-Dimensional Electron Gas
- Edgeless and Purely Gate-Defined Nanostructures in InAs Quantum Wells
- Coexistence of Topological and Normal Insulating Phases in Electro-Optically Tuned InAs/GaSb Bilayer Quantum Wells
- Impact of Layer Structure and Strain on Morphology and Electronic Properties of InAs Quantum Wells on InP (001)