Solution to the hole-doping problem and tunable quantum Hall effect in BiSe thin films
arXiv:1801.05437 · doi:10.1021/acs.nanolett.7b04033
Abstract
BiSe, one of the most widely studied topological insulators (TIs), is naturally electron-doped due to n-type native defects. However, many years of efforts to achieve p-type BiSe thin films have failed so far. Here, we provide a solution to this long-standing problem, showing that the main culprit has been the high density of interfacial defects. By suppressing these defects through an interfacial engineering scheme, we have successfully implemented p-type BiSe thin films down to the thinnest topological regime. On this platform, we present the first tunable quantum Hall effect (QHE) study in BiSe thin films, and reveal not only significantly asymmetric QHE signatures across the Dirac point but also the presence of competing anomalous states near the zeroth Landau level. The availability of doping tunable BiSe thin films will now make it possible to implement various topological quantum devices, previously inaccessible.
40 Pages, 8 Figures, 2 Tables, Accepted to Nano Letters
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Cited by in corpus (3)
- Record-High Proximity-Induced Anomalous Hall Effect in (BiSb)2Te Thin Film Grown on CrGeTe Substrate
- Bulk-Free Topological Insulator Bi2Se3 nanoribbons with Magnetotransport Signatures of Dirac Surface States
- Ferromagnetic Anomalous Hall Effect in Cr-doped BiSe Thin Films via Surface-State Engineering