Superconductor Electronics Fabrication Process with MoN Kinetic Inductors and Self-Shunted Josephson Junctions
arXiv:1801.02659 · doi:10.1109/TASC.2018.2809442
Abstract
Recent progress in superconductor electronics fabrication has enabled single-flux-quantum (SFQ) digital circuits with close to one million Josephson junctions (JJs) on 1-cm chips. Increasing the integration scale further is challenging because of the large area of SFQ logic cells, mainly determined by the area of resistively shunted Nb/AlO-Al/Nb JJs and geometrical inductors utilizing multiple layers of Nb. To overcome these challenges, we are developing a fabrication process with self-shunted high-J JJs and compact thin-film MoN kinetic inductors instead of geometrical inductors. We present fabrication details and properties of MoN films with a wide range of T, including residual stress, electrical resistivity, critical current, and magnetic field penetration depth λ. As kinetic inductors, we implemented MoN films with T about 8 K, λ about 0.51 μm, and inductance adjustable in the range from 2 to 8 pH/sq. We also present data on fabrication and electrical characterization of Nb-based self-shunted JJs with AlO tunnel barriers and J = 0.6 mA/μm, and with 10-nm thick SiNb barriers, with x from 0.03 to 0.15, fabricated on 200-mm wafers by co-sputtering. We demonstrate that the electron transport mechanism in SiNb barriers at x < 0.08 is inelastic resonant tunneling via chains of multiple localized states. At larger x, their Josephson characteristics are strongly dependent on x and residual stress in Nb electrodes, and in general are inferior to AlO tunnel barriers.
12 pages, 14 figures, 1 table, 51 references. Presented at the 13th European Conference on Applied Superconductivity, EUCAS 2017, 17-21 September 2017, Geneva, Switzerland
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