Characterizing the Structure of Topological Insulator Thin Films
arXiv:1506.08175 · doi:10.1063/1.4926455
Abstract
We describe the characterization of structural defects that occur during molecular beam epitaxy of topological insulator thin films on commonly used substrates. Twinned domains are ubiquitous but can be reduced by growth on smooth InP (111)A substrates, depending on details of the oxide desorption. Even with a low density of twins, the lattice mismatch between (Bi,Sb)2Te3 and InP can cause tilts in the film with respect to the substrate. We also briefly discuss transport in simultaneously top and back electrically gated devices using SrTiO3 and the use of capping layers to protect topological insulator films from oxidation and exposure.
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Cited by in corpus (13)
- Current-induced spin-orbit torques in ferromagnetic and antiferromagnetic systems
- Mapping the chemical potential dependence of current-induced spin polarization in a topological insulator
- Persistent Optical Gating of a Topological Insulator
- Opto-Electronic Characterization of Three Dimensional Topological Insulators
- Perspective: Heusler interfaces -- opportunities beyond spintronics?
- Local optical control of ferromagnetism and chemical potential in a topological insulator
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- Importance of van der Waals interactions for ab initio studies of topological insulators
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- Large-scale defects hidden inside a topological insulator grown onto a 2D substrate
- Nucleation and Antiphase Twin Control in BiSe via Step-Terminated AlO Substrates
- Visualizing the in-gap states in domain boundaries of ultra-thin topological insulator films