Fluorographene: Two Dimensional Counterpart of Teflon
arXiv:1006.3016 · doi:10.1002/smll.201001555
Abstract
We report a stoichiometric derivative of graphene with a fluorine atom attached to each carbon. Raman, optical, structural, micromechanical and transport studies show that the material is qualitatively different from the known graphene-based nonstoichiometric derivatives. Fluorographene is a high-quality insulator (resistivity >10^12 Ohm per square) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting Young's modulus of 100 N/m and sustaining strains of 15%. Fluorographene is inert and stable up to 400C even in air, similar to Teflon.
to appear in Small 2010
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- Gaps tunable by electrostatic gates in strained graphene
- Patterning Nanoroads and Quantum Dots on Fluorinated Graphene
- Vibrational properties of graphene fluoride and graphane
- Complementary-like Graphene Logic Gates Controlled by Electrostatic Doping
- Modelling of epitaxial graphene functionalization
- Influence of Interface Traps and Electron-Hole Puddles on Quantum Capacitance and Conductivity in Graphene Field-Effect Transistors