Highly p-doped graphene obtained by fluorine intercalation
arXiv:1104.2812 · doi:10.1063/1.3586256
Abstract
We present a method for decoupling epitaxial graphene grown on SiC(0001) by intercalation of a layer of fluorine at the interface. The fluorine atoms do not enter into a covalent bond with graphene, but rather saturate the substrate Si bonds. This configuration of the fluorine atoms induces a remarkably large hole density of p \approx 4.5 \times 1013 cm-2, equivalent to the location of the Fermi level at 0.79 eV above the Dirac point ED .
4 pages, 2 figures, in print APL
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