A 300 mm foundry silicon spin qubit unit cell exceeding 99% fidelity in all operations
arXiv:2410.15590 · doi:10.1038/s41586-025-09531-9
Abstract
Fabrication of quantum processors in advanced 300 mm wafer-scale complementary metal-oxide-semiconductor (CMOS) foundries provides a unique scaling pathway towards commercially viable quantum computing with potentially millions of qubits on a single chip. Here, we show precise qubit operation of a silicon two-qubit device made in a 300 mm semiconductor processing line. The key metrics including single- and two-qubit control fidelities exceed 99% and state preparation and measurement fidelity exceeds 99.9%, as evidenced by gate set tomography (GST). We report coherence and lifetimes up to s, s, and s. Crucially, the dominant operational errors originate from residual nuclear spin carrying isotopes, solvable with further isotopic purification, rather than charge noise arising from the dielectric environment. Our results answer the longstanding question whether the favourable properties including high-fidelity operation and long coherence times can be preserved when transitioning from a tailored academic to an industrial semiconductor fabrication technology.
10 pages, 4 figures, 4 extended data figures
References in corpus (21)
- Surface codes: Towards practical large-scale quantum computation
- Semiconductor Spin Qubits
- Computing with spin qubits at the surface code error threshold
- Fast universal quantum control above the fault-tolerance threshold in silicon
- Two-qubit silicon quantum processor with operation fidelity exceeding 99%
- A hole spin qubit in a fin field-effect transistor above 4 kelvin
- Probing single electrons across 300 mm spin qubit wafers
- Universal logic with encoded spin qubits in silicon
- High-fidelity operation and algorithmic initialisation of spin qubits above one kelvin
- The SpinBus Architecture: Scaling Spin Qubits with Electron Shuttling
- Colloquium: Advances in automation of quantum dot devices control
- Assessment of error variation in high-fidelity two-qubit gates in silicon
- Low charge noise quantum dots with industrial CMOS manufacturing
- Coherent control of electron spin qubits in silicon using a global field
- Bounds to electron spin qubit variability for scalable CMOS architectures
- Uniform Spin Qubit Devices in an All-Silicon 300 mm Integrated Process
- Towards early fault tolerance on a 2N array of qubits equipped with shuttling
- Real-time feedback protocols for optimizing fault-tolerant two-qubit gate fidelities in a silicon spin system
- Violating Bell's inequality in gate-defined quantum dots
- Impact of electrostatic crosstalk on spin qubits in dense CMOS quantum dot arrays
- Entangling gates on degenerate spin qubits dressed by a global field
Cited by in corpus (14)
- Valley Splitting Correlations Across a Silicon Quantum Well Containing Germanium
- Operating two exchange-only qubits in parallel
- Radiofrequency cascade readout of coupled spin qubits
- Interplay of Zeeman Splitting and Tunnel Coupling in Coherent Spin Qubit Shuttling
- Variability of hole spin qubits in planar Germanium
- Quantum Error Correction Assisted Axion Search in CMOS Spin Qubit Arrays
- Concatenated continuous driving of silicon qubit by amplitude and phase modulation
- Micromagnet-free operation of electron spin qubits in Si/SiGe vertical double quantum dots
- Highly Tunable Two-Qubit Interactions in Si/SiGe Quantum Dots by Interchanging the Roles of Qubit-Defining Gates
- Unfolded distillation: very low-cost magic state preparation for biased-noise qubits
- Coupling a Ge nuclear spin to an electrostatically defined quantum dot
- Phonon-induced frequency shift in semiconductor spin qubits
- Spin qubit shuttling between coupled quantum dots with inhomogeneous Landé g-tensors
- Four-state discrimination for a pair of spin qubits via gate reflectometry