Configurable Electrostatically Doped High Performance Bilayer Graphene Tunnel FET
arXiv:1509.03593 · doi:10.1109/JEDS.2016.2539919
Abstract
A bilayer graphene based electrostatically doped tunnel field-effect transistor (BED-TFET) is proposed in this work. Unlike graphene nanoribbon TFETs in which the edge states deteriorate the OFF-state performance, BED-TFETs operate based on different bandgaps induced by vertical electric fields in the source, channel, and drain regions without any chemical doping. The performance of the transistor is evaluated by self-consistent quantum transport simulations. This device has several advantages: 1) ultra-low power (VDD=0.1V), 2) high performance (ION/IOFF>104), 3) steep subthreshold swing (SS<10mv/dec), and 4) electrically configurable between N-TFET and P-TFET post fabrication. Here, the operation principle of the BED-TFET and its performance sensitivity to the device design parameters are studied.
4 pages, 6 figures in 2016 Journal of the Electron Device Society
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- Design Rules for High Performance Tunnel Transistors from 2D Materials
- Büttiker probes for dissipative phonon quantum transport in semiconductor nanostructures
- Sensitivity Challenge of Steep Transistors
- Impact of Edge States on Device Performance of Phosphorene Heterojunction Tunneling Field Effect Transistors
- Magnesium-intercalated graphene on SiC: highly n-doped air-stable bilayer graphene at extreme displacement fields
- Transport in vertically stacked hetero-structures from 2D materials
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