Electrical spin injection and transport in Germanium
arXiv:1103.5095 · doi:10.1103/PhysRevB.84.125323
Abstract
We report the first experimental demonstration of electrical spin injection, transport and detection in bulk germanium (Ge). The non-local magnetoresistance in n-type Ge is observable up to 225K. Our results indicate that the spin relaxation rate in the n-type Ge is closely related to the momentum scattering rate, which is consistent with the predicted Elliot-Yafet spin relaxation mechanism for Ge. The bias dependence of the nonlocal magnetoresistance and the spin lifetime in n-type Ge is also investigated.
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- Observation of large spin accumulation voltages in non-degenerate Si spin devices due to spin drift effect: Experiments and theory
- Spin Drift in Highly Doped n-type Si
- Spin Accumulation in Nondegenerate and Heavily Doped p-Type Germanium
- Electrical and thermal spin accumulation in germanium
- Magnetotransport in ferromagnetic Mn5Ge3, Mn5Ge3C0.8, and Mn5Si3C0.8 thin films
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- Non-local opto-electrical spin injection and detection in germanium at room temperature
- Hanle-effect measurements of spin injection from Mn5Ge3C0.8/Al2O3-contacts into degenerately doped Ge channels on Si
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- Bias current dependence of the spin lifetime in insulating AlGaAs
- Lateral Mn5Ge3 spin-valve in contact with a high-mobility Ge two-dimensional hole gas