Volatile MoS Memristors with Lateral Silver Ion Migration for Artificial Neuron Applications
arXiv:2408.09780 · doi:10.1002/smsc.202400523
Abstract
Layered two-dimensional (2D) semiconductors have shown enhanced ion migration capabilities along their van der Waals (vdW) gaps and on their surfaces. This effect can be employed for resistive switching (RS) in devices for emerging memories, selectors, and neuromorphic computing. To date, all lateral molybdenum disulfide (MoS)-based volatile RS devices with silver (Ag) ion migration have been demonstrated using exfoliated, single-crystal MoS flakes requiring a forming step to enable RS. Here, we present volatile RS with multilayer MoS grown by metal-organic chemical vapor deposition (MOCVD) with repeatable forming-free operation. The devices show highly reproducible volatile RS with low operating voltages of approximately 2 V and fast switching times down to 130 ns considering their micrometer scale dimensions. We investigate the switching mechanism based on Ag ion surface migration through transmission electron microscopy, electronic transport modeling, and density functional theory. Finally, we develop a physics-based compact model and explore the implementation of our volatile memristors as artificial neurons in neuromorphic systems.
43 pages
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Cited by in corpus (3)
- Volatile and Nonvolatile Resistive Switching in Lateral 2D Molybdenum Disulfide-Based Memristive Devices
- Unraveling the dynamics of conductive filaments in MoS based memristors by operando transmission electron microscopy
- Threshold Switching in Vertically Aligned MoS/SiO Heterostructures based on Silver Ion Migration