van der Waals Bonded Co/h-BN Contacts to Ultrathin Black Phosphorus Devices

Abstract

Due to the chemical inertness of 2D hexagonal-Boron Nitride (h-BN), few atomic-layer h-BN is often used to encapsulate air-sensitive 2D crystals such as Black Phosphorus (BP). However, the effects of h-BN on Schottky barrier height, doping and contact resistance are not well known. Here, we investigate these effects by fabricating h-BN encapsulated BP transistors with cobalt (Co) contacts. In sharp contrast to directly Co contacted p-type BP devices, we observe strong n-type conduction upon insertion of the h-BN at the Co/BP interface. First principles calculations show that this difference arises from the much larger interface dipole at the Co/h-BN interface compared to the Co/BP interface, which reduces the work function of the Co/h-BN contact. The Co/h-BN contacts exhibit low contact resistances (~ 4.5 k-ohm), and are Schottky barrier free. This allows us to probe high electron mobilities (4,200 cm2/Vs) and observe insulator-metal transitions even under two-terminal measurement geometry.

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• Highly anisotropic spin transport in ultrathin black phosphorus
• Bilayer h-BN Barriers for Tunneling Contacts in Fully-Encapsulated Monolayer $\mathbf{MoS}{\mathbf{e}}_2$ Field-Effect Transistors
• Ohmic contact engineering in few-layer black Phosphorus field effect transistors
• Carrier Drift Control of Spin Currents in Graphene-Based Spin-Current Demultiplexers
• Negative Photoconductance in van der Waals Heterostructures-Based Floating Gate Phototransistor