Metal to insulator quantum-phase transition in few-layered ReS
arXiv:1510.02128 · doi:10.1021/acs.nanolett.5b04100
Abstract
In ReS a layer-independent direct band-gap of 1.5 eV implies a potential for its use in optoelectronic applications. ReS crystallizes in the 1T-structure which leads to anisotropic physical properties and whose concomitant electronic structure might host a non-trivial topology. Here, we report an overall evaluation of the anisotropic Raman response and the transport properties of few-layered ReS field-effect transistors. We find that ReS exfoliated on SiO behaves as an -type semiconductor with an intrinsic carrier mobility surpassing ~30 cm/Vs at K which increases up to ~350 cm/Vs at 2 K. Semiconducting behavior is observed at low electron densities , but at high values of n the resistivity decreases by a factor > 7 upon cooling to 2 K and displays a metallic -dependence. This indicates that the band structure of 1T-ReS is quite susceptible to an electric field applied perpendicularly to the layers. The electric-field induced metallic state observed in transition metal dichalcogenides was recently claimed to result from a percolation type of transition. Instead, through a scaling analysis of the conductivity as a function of and , we find that the metallic state of ReS results from a second-order metal to insulator transition driven by electronic correlations. This gate-induced metallic state offers an alternative to phase engineering for producing ohmic contacts and metallic interconnects in devices based on transition metal dichalcogenides.
25 pages, 5 figures
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