Top-gated graphene field-effect-transistors formed by decomposition of SiC
arXiv:0802.4103 · doi:10.1063/1.2889959
Abstract
Top-gated, few-layer graphene field-effect transistors (FETs) fabricated on thermally-decomposed semi-insulating 4H-SiC substrates are demonstrated. Physical vapor deposited SiO2 is used as the gate dielectric. A two-dimensional hexagonal arrangement of carbon atoms with the correct lattice vectors, observed by high-resolution scanning tunneling microscopy, confirms the formation of multiple graphene layers on top of the SiC substrates. The observation of n-type and p-type transition further verifies Dirac Fermions unique transport properties in graphene layers. The measured electron and hole mobility on these fabricated graphene FETs are as high as 5400 cm2/Vs and 4400 cm2/Vs respectively, which are much larger than the corresponding values from conventional SiC or silicon.
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Cited by in corpus (8)
- Production, properties and potential of graphene
- Anomalous Doping Effects on Charge Transport in Graphene Nanoribbons
- Screening and interlayer coupling in multilayer graphene field-effect transistors
- Non-volatile switching in graphene field effect devices
- Charge transfer between epitaxial graphene and silicon carbide
- Modeling edge effects in Graphene Nanoribbon Field-effect Transistors with real and mode space methods
- Magneto-conductance Oscillations in Graphene Antidot Arrays
- Mimicking Nanoribbon Behavior Using a Graphene Layer on SiC