Gate-induced ionization of single dopant atoms
arXiv:cond-mat/0309134 · doi:10.1103/PhysRevB.68.193302
Abstract
Gate-induced wave function manipulation of a single dopant atom is a possible basis of atomic scale electronics. From this perspective, we analyzed the effect of a small nearby gate on a single dopant atom in a semiconductor up to field ionization. The dopant is modelled as a hydrogen-like impurity and the Schrodinger equation is solved by a variational method. We find that--depending on the separation of the dopant and the gate--the electron transfer is either gradual or abrupt, defining two distinctive regimes for the gate-induced ionization process.
5 pages, 3 EPS-figures. To be published in Phys. Rev. B
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- Numerical study of hydrogenic effective mass theory for an impurity P donor in Si in the presence of an electric field and interfaces
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