Band tail interface states and quantum capacitance in a monolayer molybdenum disulfide field-effect-transistor
arXiv:1801.10345 · doi:10.1088/1361-6463/aaa58c
Abstract
Although MoS2 field-effect transistors (FETs) with high-k dielectrics are promising for electron device applications, the underlying physical origin of interface degradation remains largely unexplored. Here, we present a systematic analysis of the energy distribution of the interface state density (Dit) and the quantum capacitance (CQ) in a dual-gate monolayer exfoliated MoS2 FET. The CQ analysis enabled us to construct a Dit extraction method as a function of EF. A band tail distribution of Dit with the lowest value of 8*1011 cm-2eV-1 suggests that Dit is not directly related to the sharp peak energy distribution of the S vacancy. Therefore, the Mo-S bond bending related to the strain at the interface or the surface roughness of the SiO2/Si substrate might be the origin. It is also shown that ultra-thin 2D materials are more sensitive to interface disorder due to the reduced density of states. Since all the constituents for the measured capacitance are well understood, I-V characteristics can be reproduced by utilizing the drift current model. As a result, one of the physical origins of the metal/insulator transition is suggested to be the external outcome of interface traps and quantum capacitance.
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- Understanding interface properties in 2D heterostructure FETs
- Direct observation of electron capture & emission processes by the time domain charge pumping measurement of MoS2 FET
- Quantum-mechanical effect in atomically thin MoS2 FET
- The gate tunable 2D pn junction driven out-of-equilibrium
- Integrating high-quality dielectrics with one-nanometer equivalent oxide thickness on two-dimensional electronic devices