90 citations · 159 across the 4 of their papers we have counts for
4 papers
NiOx/\b{eta}-Ga2O3 Heterojunction Diode Achieving Breakdown Voltage >3 kV with Plasma Etch Field-Termination
Yizheng Liu, Saurav Roy, Carl Peterson +2
This work reports the fabrication and characterization of a NiOx/\b{eta}-Ga2O3 heterojunction diode (HJD) that uses a metallic nickel (Ni) target to deposit NiOx layers via reactiv…
Over 6 m thick MOCVD-grown Low-Background Carrier Density (10 cm) High-Mobility (010) -GaO Drift Layers
Arkka Bhattacharyya, Carl Peterson, Kittamet Chanchaiworawit +4
This work reports high carrier mobilities and growth rates, simultaneously in low unintentionally-doped UID (10 cm) MOCVD-grown thick -GaO epitaxial drift…
4.4 kV -GaO Power MESFETs with Lateral Figure of Merit exceeding 100 MW/cm
Arkka Bhattacharyya, Shivam Sharma, Fikadu Alema +7
Field-plated (FP) depletion-mode MOVPE-grown -GaO lateral MESFETs are realized with superior reverse breakdown voltages and ON currents. A sandwiched SiN dielectric…
Multi-kV class -GaO MESFETs with a Lateral Figure of Merit up to 355 MW/cm
Arkka Bhattacharyya, Praneeth Ranga, Saurav Roy +5
We demonstrate over 3 kV gate-pad-connected field plated (GPFP) -GaO lateral MESFETs with high lateral figure of merit (LFOM) using metalorganic vapor phase epitaxy (MOV…