Valley relaxation of resident electrons and holes in a monolayer semiconductor: Dependence on carrier density and the role of substrate-induced disorder
arXiv:2103.05752 · doi:10.1103/PhysRevMaterials.5.044001
Abstract
Using time-resolved optical Kerr rotation, we measure the low temperature valley dynamics of resident electrons and holes in exfoliated WSe monolayers as a systematic function of carrier density. In an effort to reconcile the many disparate timescales of carrier valley dynamics in monolayer semiconductors reported to date, we directly compare the doping-dependent valley relaxation in two electrostatically-gated WSe monolayers having different dielectric environments. In a fully-encapsulated structure (hBN/WSe/hBN, where hBN is hexagonal boron nitride), valley relaxation is found to be monoexponential. The valley relaxation time is quite long (10~s) at low carrier densities, but decreases rapidly to less than 100~ns at high electron or hole densities 2 ~cm. In contrast, in a partially-encapsulated WSe monolayer placed directly on silicon dioxide (hBN/WSe/SiO), carrier valley relaxation is multi-exponential at low carrier densities. The difference is attributed to environmental disorder from the SiO substrate. Unexpectedly, very small out-of-plane magnetic fields can increase , especially in the hBN/WSe/SiO structure, suggesting that localized states induced by disorder can play an important role in depolarizing spins and mediating the valley relaxation of resident carriers in monolayer transition metal-dichalcogenide semiconductors.
11 pages, 5 figures
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