Induced quantum dot probe for material characterization
arXiv:1809.03523 · doi:10.1063/1.5053756
Abstract
We propose a non-destructive means of characterizing a semiconductor wafer via measuring parameters of an induced quantum dot on the material system of interest with a separate probe chip that can also house the measurement circuitry. We show that a single wire can create the dot, determine if an electron is present, and be used to measure critical device parameters. Adding more wires enables more complicated (potentially multi-dot) systems and measurements. As one application for this concept we consider silicon metal-oxide-semiconductor and silicon/silicon-germanium quantum dot qubits relevant to quantum computing and show how to measure low-lying excited states (so-called "valley" states). This approach provides an alternative method for characterization of parameters that are critical for various semiconductor-based quantum dot devices without fabricating such devices.
arXiv comment5 pages, 3 figures
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Cited by in corpus (9)
- Semiconductor Spin Qubits
- Superconductor-semiconductor hybrid cavity quantum electrodynamics
- Cryogen-free scanning gate microscope for the characterization of Si/SiGe quantum devices at milli-Kelvin temperatures
- Spin-Valley Qubit Dynamics In Exchange Coupled Silicon Quantum Dots
- Radio-frequency C-V measurements with sub-attofarad sensitivity
- Democratizing Spin Qubits
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- Second Quantization: Gating a Quantum Dot Through the Sequential Removal of Single Electrons from a Nanoscale Floating Gate
- Towards Utilizing Scanning Gate Microscopy as a High-Resolution Probe of Valley Splitting in Si/SiGe Heterostructures