Atomic-Layer-Deposited Al2O3 on Bi2Te3 for Topological Insulator Field-Effect Transistors
arXiv:1108.1333 · doi:10.1063/1.3622306
Abstract
We report dual-gate modulation of topological insulator field-effect transistors (TI FETs) made on Bi2Te3 thin flakes with integration of atomic-layer-deposited (ALD) Al2O3 high-k dielectric. Atomic force microscopy study shows that ALD Al2O3 is uniformly grown on this layer-structured channel material. Electrical characterization reveals that the right selection of ALD precursors and the related surface chemistry play a critical role in device performance of Bi2Te3 based TI FETs. We realize both top-gate and bottom-gate control on these devices, and the highest modulation rate of 76.1% is achieved by using simultaneous dual gate control.
4 pages, 3 figures
References in corpus (7)
- Topological Insulators
- Two Dimensional Atomic Crystals
- Topological Order and the Quantum Spin Hall Effect
- Topological Insulators with Inversion Symmetry
- Experimental demonstration of the topological surface states protected by the time-reversal symmetry
- Surface State Transport and Ambipolar Electric Field Effect in Bi2Se3 Nanodevices
- Insulating behavior in ultra-thin bismuth selenide field effect transistors
Cited by in corpus (12)
- MoS2 Dual-Gate MOSFET with Atomic-Layer-Deposited Al2O3 as Top-Gate Dielectric
- The Integration of High-k Dielectric on Two-Dimensional Crystals by Atomic Layer Deposition
- Observation of Quantum-Tunneling Modulated Spin Texture in Ultrathin Topological Insulator Bi2Se3 Films
- MoS2 Nanoribbon Transistors: Transition from Depletion-mode to Enhancement-mode by Channel Width Trimming
- Top gating of epitaxial (Bi_{1-x}Sb_x)2Te3 topological insulator thin films
- Gate-tunable transport properties of in-situ capped BiTe topological insulator thin films
- Conductance modulation in topological insulator Bi2Se3 thin films with ionic liquid gating
- Quantum Transport and Potential of Topological States for Thermoelectricity in BiTe Thin Films
- Simultaneous electrical-field-effect modulation of both top and bottom Dirac surface states of epitaxial thin films of three-dimensional topological insulators
- Using ultra-thin parylene films as an organic gate insulator in nanowire field-effect transistors
- Momentum relaxation effects in 2D-Xene field effect device structures
- Magnetoexcitons and optical absorption of bilayer-structured topological insulators