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National Microelectronics Institute

United Kingdom

14 papers here74 citations across 14
fields
  • cs.AR3
  • eess.IV3
  • cs.RO2
  • cs.AI1
  • cs.LG1
  • eess.SP1
  • physics.flu-dyn1
  • physics.med-ph1
ROR 003ck6433OpenAlex

affiliations via OpenAlex

output
20182025
most citedScalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography

36 citations

researchers with a paper here
  • T. Prodromakis3 · h 13
  • I. Gyongy2 · h 26
  • R. Henderson2 profiles2 · h 48
  • Shady O. Agwa2 · h 7
  • Abderrahim Halimi1 · h 30
  • A. Erdogan1 · h 4
  • Ahmed J. Abdelmaksoud1 · h 1
  • Alan Mollins1 · h 1
  • Alexander Serb1 · h 15
  • Alistair Gorman1 · h 2
  • Brian D. Gerardot1
  • Camelia Dunare1 · h 2
collaborating institutions
  • University of EdinburghGB6 papers
  • Heriot-Watt UniversityGB2 papers
  • Heriot-Watt University MalaysiaMY1 paper
  • Leibniz Institute of Surface EngineeringDE1 paper
  • Queen's University BelfastGB1 paper
  • University of BathGB1 paper
  • University of StrathclydeGB1 paper
Showing 2023Show all

1 paper · 1 filter

physics.optics2023★ 36 cited

Scalable fabrication of hemispherical solid immersion lenses in silicon carbide through grayscale hard-mask lithography

Christiaan Bekker, Muhammad Junaid Arshad, Pasquale Cilibrizzi +8

Grayscale lithography allows the creation of micrometer-scale features with spatially-controlled height in a process that is fully compatible with standard lithography. Here, solid…

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