10 citations · 44 across the 14 of their papers we have counts for
14 papers
AES Analysis of Al Bond Pads in Electrically Insulating Surroundings Utilizing Metal Grid Contacting
Uwe Scheithauer
Bond pads are the electrical interconnections of a microelectronic device to the outside world. A polyimide layer (PI) on top of a microelectronic device protects the whole device…
Depth resolution optimized sputter depth profiling of a polycrystalline Al layer
Uwe Scheithauer
Depth profiling of thin films by inert gas sputtering is one of the most important applications of Auger electron spectroscopy and X-ray photoelectron spectroscopy. Such an analysi…
Experimental setups for XPS measurements beyond the instrumental lateral resolution limit
Uwe Scheithauer
The lateral resolution of an X-ray photoelectron spectroscopy instrument, which is equipped with a focused X-ray beam, is limited by the nominal X-ray beam diameter and the long ta…
The Benefit of Wide Energy Range Spectrum Acquisition During Sputter Depth Profile Measurements
Uwe Scheithauer
Thin film systems are often analysed by using sputter depth profiling. First the sample gets eroded by inert gas ion impact during sputter depth profiling. Then the elemental compo…
Analysis of a Sputtered Si Surface for Ar Sputter Gas Supply Purity Monitoring
Uwe Scheithauer
For sputter depth profiling often sample erosion by Ar+ ions is used. Only a high purity of the sputter gas and a low contamination level of the ion gun avoids misleading depth pro…
Vacuum Quality Monitoring of Analytical Sputter Depth Profile Equipment by Recontamination Measurements of a Sputtered Ti Surface
Uwe Scheithauer
Often a surface sensitive analytical technique in combination with sample erosion by inert ion sputtering is used for compositional in-depth analysis of solid state samples. Layer…