Flux-trapping characterization for superconducting electronics using a cryogenic widefield N-$V$ diamond microscope

Abstract

Magnetic flux trapping is a significant hurdle limiting the reliability and scalability of superconducting electronics, yet tools for imaging flux vortices remain slow or insensitive. We present a cryogenic widefield NV-diamond magnetic microscope capable of rapid, micrometer-scale imaging of flux trapping in superconducting devices. Using this technique, we measure vortex expulsion fields in Nb thin films and patterned strips, revealing a crossover in expulsion behavior between $10$ and $20\mu$m strip widths. The observed scaling agrees with theoretical models and suggests the influence of film defects on vortex expulsion dynamics. This instrument enables high-throughput magnetic characterization of superconducting materials and circuits, providing new insight for flux mitigation strategies in scalable superconducting electronics.

9 pages main text (5 figures), 7 pages supplementary information (5 figures)

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Cited by in corpus (1)

• Flux trapping in NbTiN strips