Probing the uniaxial strain-dependent valley drift and Berry curvature in monolayer MoSi$_2$N$_4$

Sajjan Sheoran; Saswata Bhattacharya

doi:10.1103/PhysRevMaterials.7.114003

paper

Probing the uniaxial strain-dependent valley drift and Berry curvature in monolayer MoSi $_{2}$ N $_{4}$

arXiv:2302.13123 · doi:10.1103/PhysRevMaterials.7.114003

Abstract

We use ab initio calculations and theoretical analysis to investigate the influence of in-plane strain field on valley drifts and Berry curvatures in the monolayer MoSi $_{2}$ N $_{4}$ , a prototypical septuple atomic layered two-dimensional material. The low energy electron and hole valleys drift far off the K/K' point under uniaxial strains. The direction and strength of valley drift strongly depend on the nature of the charge carrier and uniaxial strain with a more substantial response along the zigzag path. Our findings are governed by the interplay between microscopic orbital contribution and symmetry lowering. The changing geometric properties of Bloch states affect the Berry curvatures and circular dichroism. Specifically, Berry curvature dipole is significantly enhanced under the tensile strain along armchair and zigzag directions. Meanwhile, the particle-hole asymmetry arising from non-equivalent electron and hole valley drifts relax the selection rules, thus reducing the degree of circular polarization up to ~0.98. Therefore, strain engineering of valley physics in the monolayer MoSi $_{2}$ N $_{4}$ is of prime importance for valleytronics.

Probing the uniaxial strain-dependent valley drift and Berry curvature in monolayer MoSi $_{2}$ N $_{4}$

Abstract

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Probing the uniaxial strain-dependent valley drift and Berry curvature in monolayer MoSi2​N4​

Abstract

References in corpus (23)

Cited by in corpus (3)

Probing the uniaxial strain-dependent valley drift and Berry curvature in monolayer MoSi $_{2}$ N $_{4}$