Magnetotransport in BiSe thin films epitaxially grown on Ge(111)
arXiv:1808.00979 · doi:10.1063/1.5048547
Abstract
Topological insulators (TIs) like BiSe are a class of material with topologically protected surface states in which spin-momentum locking may enable spin-polarized and defect-tolerant transport. In this work, we achieved the epitaxial growth of BiSe thin films on germanium, which is a key material for microelectronics. Germanium also exhibits interesting properties with respect to the electron spin such as a spin diffusion length of several micrometers at room temperature. By growing BiSe on germanium, we aim at combining the long spin diffusion length of Ge with the spin-momentum locking at the surface of BiSe. We first performed a thorough structural analysis of BiSe films using electron and x-ray diffraction as well as atomic force microscopy. Then, magnetotransport measurements at low temperature showed the signature of weak antilocalization as a result of two-dimensional transport in the topologically protected surface states of BiSe. Interestingly, the magnetotransport measurements also point out that the conduction channel can be tuned between the BiSe film and the Ge layer underneath by means of the bias voltage or the applied magnetic field. This result suggests that the BiSe/Ge junction is a promising candidate for tuning spin-related phenomena at interfaces between TIs and semiconductors.
arXiv comment18 pages, 8 figures
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- Observation of Large Unidirectional Rashba Magnetoresistance in Ge(111)
- Spin-orbit readout using thin films of topological insulator Sb2Te3 deposited by industrial magnetron sputtering
- Spin-orbitronics at a topological insulator-semiconductor interface
- Magnetic Order in 3D Topological Insulators -- Wishful Thinking or Gateway to Emergent Quantum Effects?