Full field electron spectromicroscopy applied to ferroelectric materials
arXiv:1806.04849 · doi:10.1063/1.4801968
Abstract
The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structure of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented.
arXiv comment15 pages, 9 figures
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Cited by in corpus (4)
- Control of surface potential at polar domain walls in a nonpolar oxide
- Imaging and characterization of conducting ferroelectric domain walls by photoemission electron microscopy
- Polarization sensitive surface band structure of doped BaTiO3(001)
- High-contrast imaging of 180° ferroelectric domains by optical microscopy using ferroelectric liquid crystals