Charge collection properties of irradiated depleted CMOS pixel test structures
arXiv:1801.03671 · doi:10.1016/j.nima.2018.06.062
Abstract
Edge-TCT and charge collection measurements with passive test structures made in LFoundry 150 nm CMOS process on p-type substrate with initial resistivity of over 3 kcm are presented. Measurements were made before and after irradiation with reactor neutrons up to 210 n/cm. Two sets of devices were investigated: unthinned (700 m) with substrate biased through the implant on top and thinned (200 m) with processed and metallised back plane. Depleted depth was estimated with Edge-TCT and collected charge was measured with Sr source using an external amplifier with 25 ns shaping time. Depleted depth at given bias voltage decreased with increasing neutron fluence but it was still larger than 70 m at 250 V after the highest fluence. After irradiation much higher collected charge was measured with thinned detectors with processed back plane although the same depleted depth was observed with Edge-TCT. Most probable value of collected charge of over 5000 electrons was measured also after irradiation to 210 n/cm. This is sufficient to ensure successful operation of these detectors at the outer layer of the pixel detector in the ATLAS experiment at the upgraded HL-LHC.
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