Vanishing quasiparticle density in a hybrid Al/Cu/Al single-electron transistor
arXiv:1106.1326 · doi:10.1103/PhysRevB.85.012504
Abstract
The achievable fidelity of many nanoelectronic devices based on superconducting aluminum is limited by either the density of residual nonequilibrium quasiparticles n_qp or the density of quasiparticle states in the gap, characterized by Dynes parameter γ. We infer upper bounds n_qp < 0.033 um^-3 and γ< 1.6*10^-7 from transport measurements performed on Al/AlOx/Cu single-electron transistors, improving previous results by an order of magnitude. Owing to efficient microwave shielding and quasiparticle relaxation, typical number of quasiparticles in the superconducting leads is zero.
5 pages, 3 figures; updated to revised version that was accepted for publication, contains data from a reference sample without qp traps
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