paper

Electrically-induced n-i-p junctions in multiple graphene layer structures

arXiv:1002.1778 · doi:10.1103/PhysRevB.82.075419

Abstract

The Fermi energies of electrons and holes and their densities in different graphene layers (GLs) in the n- and p-regions of the electrically induced n-i-p junctions formed in multiple-GL structures are calculated both numerically and using a simplified analytical model. The reverse current associated with the injection of minority carriers through the n- and p-regions in the electrically-induced n-i-p junctions under the reverse bias is calculated as well. It is shown that in the electrically-induced n-i-p junctions with moderate numbers of GLs the reverse current can be substantially suppressed. Hence, multiple-GL structures with such n-i-p junctions can be used in different electron and optoelectron devices.

7 pages, 6 figures

References in corpus (12)

Cited by in corpus (9)