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NaMLab (Germany)

Germany

27 papers here1.3k citations across 27
fields
  • cond-mat.mtrl-sci13
  • cs.ET6
  • physics.app-ph5
  • cond-mat.mes-hall2
  • eess.SY1
ROR 028070c57OpenAlex

affiliations via OpenAlex

output
20112024
most citedPhotoferroelectric oxides

315 citations

researchers with a paper here
  • T. Mikolajick2 profiles20 · h 90
  • S. Slesazeck16 · h 54
  • S. Lancaster8 · h 9
  • Erika Covi5 · h 4
  • U. Schroeder5 · h 75
  • Q. Duong4 · h 4
  • D. Kappel3 · h 16
  • H. Schmidt3 · h 41
  • M. Helm3 · h 54
  • M. Hoffmann3 · h 26
  • Shengqiang Zhou3 · h 48
  • W. Weber3 · h 34
collaborating institutions
  • Technische Universität DresdenDE14 papers
  • Helmholtz-Zentrum Dresden-RossendorfDE3 papers
  • Center for Advancing Electronics DresdenDE2 papers
  • ETH ZurichCH2 papers
  • Forschungszentrum JülichDE2 papers
  • Georgia Institute of TechnologyUS2 papers
  • Institute of NeuroinformaticsCH2 papers
  • Madrid Institute for Advanced StudiesES2 papers
  • Munich University of Applied SciencesDE2 papers
  • RWTH Aachen UniversityDE2 papers
  • State Key Laboratory of Electronic Thin Films and Integrated Devices2 papers
  • Technion – Israel Institute of TechnologyIL2 papers
Showing 2024Show all

1 paper · 1 filter

cond-mat.mtrl-sci2024★ 12 cited

Long-term stability and oxidation of ferroelectric AlScN devices: An operando HAXPES study

Oliver Rehm, Lutz Baumgarten, Roberto Guido +6

Aluminum scandium nitride (Al1−x​Scx​N) is a promising material for ferroelectric devices due to its large remanent polarization, scalability, and compatibility with semicond…

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