activity
20092014
most citedEnhancement mode double top gated MOS nanostructures with tunable lateral geometry

64 citations · 229 across the 9 of their papers we have counts for

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Showing cond-mat.mes-hallShow all

6 papers · 1 filter

cond-mat.mes-hall2014★ 26 cited

Efficient self-consistent quantum transport simulator for quantum devices

Xujiao Gao, Denis Mamaluy, Erik Nielsen +6

We present a self-consistent one-dimensional (1D) quantum transport simulator based on the Contact Block Reduction (CBR) method, aiming for very fast and robust transport simulatio…

cond-mat.mes-hall2014★ 35 cited

QCAD Simulation and Optimization of Semiconductor Quantum Dots

Xujiao Gao, Erik Nielsen, Richard P. Muller +5

We present the Quantum Computer Aided Design (QCAD) simulator that targets modeling multi-dimensional quantum devices, particularly silicon multi-quantum dots (QDs) developed for q…

cond-mat.mes-hall2011★ 1 cited

Triangulating tunneling resonances in a point contact

Nathaniel C. Bishop, Ralph W. Young, Gregory A. Ten Eyck +8

We observe resonant tunneling in silicon split gate point contacts implanted with antimony and defined in a self-aligned poly-silicon double gate enhancement mode Si-MOS device str…

cond-mat.mes-hall2010★ 23 cited

Double quantum dot with tunable coupling in an enhancement-mode silicon metal-oxide semiconductor device with lateral geometry

L. A. Tracy, E. P. Nordberg, R. W. Young +9

We present transport measurements of a tunable silicon metal-oxide-semiconductor double quantum dot device with lateral geometry. Experimentally extracted gate-to-dot capacitances…

cond-mat.mes-hall2009★ 33 cited

Charge sensing in enhancement mode double-top-gated metal-oxide-semiconductor quantum dots

E. P. Nordberg, H. L. Stalford, R. Young +10

Laterally coupled charge sensing of quantum dots is highly desirable, because it enables measurement even when conduction through the quantum dot itself is suppressed. In this work…

cond-mat.mes-hall2009★ 64 cited

Enhancement mode double top gated MOS nanostructures with tunable lateral geometry

E. P. Nordberg, G. A. Ten Eyck, H. L. Stalford +11

We present measurements of silicon (Si) metal-oxide-semiconductor (MOS) nanostructures that are fabricated using a process that facilitates essentially arbitrary gate geometries. S…