Reducing disorder in Ge quantum wells by using thick SiGe barriers
arXiv:2410.03256 · doi:10.1063/5.0242746
Abstract
We investigate the disorder properties of two-dimensional hole gases in Ge/SiGe heterostructures grown on Ge wafers, using thick SiGe barriers to mitigate the influence of the semiconductor-dielectric interface. Across several heterostructure field effect transistors we measure an average maximum mobility of at a saturation density of , corresponding to a long mean free path of . The highest measured mobility is . We identify uniform background impurities and interface roughness as the dominant scattering mechanisms limiting mobility in a representative device, and we evaluate a percolation-induced critical density of . This low-disorder heterostructure, according to simulations, may support the electrostatic confinement of holes in gate-defined quantum dots.
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