NiGaO interfacial layers in NiO/GaO heterojunction diodes at high temperature
arXiv:2401.06924
Abstract
NiO/GaO heterojunction diodes have attracted attention for high-power applications, but their high-temperature performance and reliability remain underexplored. Here we report on the time evolution of the static electrical properties in the widely studied p-NiO/n-GaOheterojunction diodes and the formation of NiGaO interfacial layers when operated at C. Results of our thermal cycling experiment show an initial leakage current increase which stabilizes after sustained thermal load, due to reactions at the NiO-GaO interface. High-resolution TEM microstructure analysis of the devices after thermal cycling indicates that the NiO-GaO interface forms ternary compounds at high temperatures, and thermodynamic calculations suggest the formation of the spinel NiGaO layer between NiO and GaO. First-principles defect calculations find that NiGaO shows low p-type intrinsic doping, and hence can also serve to limit electric field crowding at the interface. Vertical NiO/GaO diodes with intentionally grown 5 nm thin spinel-type NiGaO interfacial layers show excellent device ON/OFF ratio of > 10(3 V), V of ~1.9 V, and breakdown voltage of ~ 1.2 kV for an initial unoptimized 300-micron diameter device. These p-n heterojunction diodes are promising for high-voltage, high-temperature applications.
16 pages, 5 figures