Impact of interface traps on charge noise, mobility and percolation density in Ge/SiGe heterostructures
arXiv:2310.05902 · doi:10.1038/s43246-024-00563-8
Abstract
Hole spins in Ge/SiGe heterostructure quantum dots have emerged as promising qubits for quantum computation. The strong spin-orbit coupling (SOC), characteristic of heavy-hole states in Ge, enables fast and all-electrical qubit control. However, SOC also increases the susceptibility of spin qubits to charge noise. While qubit coherence can be significantly improved by operating at sweet spots with reduced hyperfine or charge noise sensitivity, the latter ultimately limits coherence, underlining the importance of understanding and reducing charge noise at its source. In this work, we study the voltage-induced hysteresis commonly observed in SiGe-based quantum devices and show that the dominant charge fluctuators are localized at the semiconductor-oxide interface. By applying increasingly negative gate voltages to Hall bar and quantum dot devices, we investigate how the hysteretic filling of interface traps impacts transport metrics and charge noise. We find that the gate-induced accumulation and trapping of charge at the SiGe-oxide interface leads to an increased electrostatic disorder, as probed by transport measurements, as well as the activation of low-frequency relaxation dynamics, resulting in slow drifts and increased charge noise levels. Our results highlight the importance of a conservative device tuning strategy and reveal the critical role of the semiconductor-oxide interface in SiGe heterostructures for spin qubit applications.
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- Compromise-Free Scaling of Qubit Speed and Coherence
- A backgate for enhanced tunability of holes in planar germanium
- Impact of surface treatments on the transport properties of germanium 2DHGs
- A dressed singlet-triplet qubit in germanium
- Variability of hole spin qubits in planar Germanium
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- Bootstrapping, autonomous testing, and initialization system for Si/SiGe multi-quantum-dot devices
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