Probing material absorption and optical nonlinearity of integrated photonic materials

Abstract

Optical microresonators with high quality ($Q$) factors are essential to a wide range of integrated photonic devices. Steady efforts have been directed towards increasing microresonator $Q$ factors across a variety of platforms. With success in reducing microfabrication process-related optical loss as a limitation of $Q$, the ultimate attainable $Q$, as determined solely by the constituent microresonator material absorption, has come into focus. Here, we report measurements of the material-limited $Q$ factors in several photonic material platforms. High-$Q$ microresonators are fabricated from thin films of SiO${}_2$, Si${}_3$N${}_4$, Al${}_{0.2}$Ga${}_{0.8}$As and Ta${}_2$O${}_5$. By using cavity-enhanced photothermal spectroscopy, the material-limited $Q$ is determined. The method simultaneously measures the Kerr nonlinearity in each material and reveals how material nonlinearity and ultimate $Q$ vary in a complementary fashion across photonic materials. Besides guiding microresonator design and material development in four material platforms, the results help establish performance limits in future photonic integrated systems.

Maodong Gao, Qi-Fan Yang and Qing-Xin Ji contributed equally to this work. 9 pages, 4 figures, 1 table

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