Activation of magnetic moments in CVD-grown graphene by annealing
arXiv:2107.02824
Abstract
Effects of annealing on chemical vapor deposited graphene are investigated via a weak localization magnetoresistance measurement. Annealing at \SI{300}{\celsius} in inert gases, a common cleaning procedure for graphene devices, is found to raise the dephasing rate significantly above the rate from electron-electron interactions, which would otherwise be expected to dominate dephasing at 4 K and below. This extra dephasing is apparently induced by local magnetic moments activated by the annealing process, and depends strongly on the backgate voltage applied.
References in corpus (8)
- Boron nitride substrates for high-quality graphene electronics
- Magnetism in Graphene Induced by Single-Atom Defects
- Intrinsic Response of Graphene Vapor Sensors
- Weak localisation magnetoresistance and valley symmetry in graphene
- Weak localisation in graphene flakes
- Defect-mediated spin relaxation and dephasing in graphene
- Interactions and magnetic moments near vacancies and resonant impurities in graphene
- Asymmetric Electron-Hole Decoherence in Ion-Gated Epitaxial Graphene