paper

Preparation of clean surfaces and Se vacancy formation in BiSe by ion bombardment and annealing

arXiv:1612.05331 · doi:10.1016/j.susc.2017.04.004

Abstract

Bismuth Selenide (BiSe) is a topological insulator (TI) with a structure consisting of stacked quintuple layers. Single crystal surfaces are commonly prepared by mechanical cleaving. This work explores the use of low energy Ar ion bombardment and annealing (IBA) as an alternative method to produce reproducible and stable BiSe surfaces under ultra-high vacuum (UHV). It is found that a well-ordered surface can be prepared by a single cycle of 1 keV Ar ion bombardment and 30 min of annealing. Low energy electron diffraction (LEED) and detailed low energy ion scattering (LEIS) measurements show no differences between IBA-prepared surfaces and those prepared by cleaving in UHV. Analysis of the LEED patterns shows that the optimal annealing temperature is 450°C. Angular LEIS scans reveal the formation of surface Se vacancies when the annealing temperature exceeds 520°C.

32 pages, 10 figures

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