137 citations
- Centre National de la Recherche ScientifiqueFR5 papers
- National Physical LaboratoryGB3 papers
- Royal Holloway University of LondonGB3 papers
- University of HelsinkiFI3 papers
- VTT Technical Research Centre of FinlandFI3 papers
- Aalto UniversityFI2 papers
- Bavarian Academy of Sciences and HumanitiesDE2 papers
- Eindhoven University of TechnologyNL2 papers
- Helsinki Institute of PhysicsFI2 papers
- Munich Center for Quantum Science and TechnologyDE2 papers
- Plasma Technology (United States)US2 papers
- Princeton UniversityUS2 papers
23 papers
Normal high velocity solid dust impacts on tiles of tokamak-relevant temperature
Marco De Angeli, Panagiotis Tolias, Francisco Suzuki-Vidal +7
Runaway electron incidence on plasma facing components triggers explosive events that are accompanied by the expulsion of fast solid debris. Subsequent dust-wall high speed impacts…
Cryogenic microwave link for quantum local area networks
W. K. Yam, M. Renger, S. Gandorfer +16
Scalable quantum information processing with superconducting circuits is expected to advance from individual processors located in single dilution refrigerators to more powerful di…
Subsampling Methods for Fast Electron Backscattered Diffraction Analysis
Zoë Broad, Daniel Nicholls, Jack Wells +5
Despite advancements in electron backscatter diffraction (EBSD) detector speeds, the acquisition rates of 4-Dimensional (4D) EBSD data, i.e., a collection of 2-dimensional (2D) dif…
Isotropic plasma-thermal atomic layer etching of superconducting TiN films using sequential exposures of molecular oxygen and SFH plasma
Azmain A. Hossain, Haozhe Wang, David S. Catherall +4
Microwave loss in superconducting titanium nitride (TiN) films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced…
Circle fit optimization for resonator quality factor measurements: point redistribution for maximal accuracy
Paul G. Baity, Connor Maclean, Valentino Seferai +4
The control of material loss mechanisms is playing an increasingly important role for improving coherence times of superconducting quantum devices. Such material losses can be char…
Plasma-enhanced atomic layer deposition of AlO on graphene using monolayer hBN as interfacial layer
Barbara Canto, Martin Otto, Michael J. Powell +7
The deposition of dielectric materials on graphene is one of the bottlenecks for unlocking the potential of graphene in electronic applications. In this paper we demonstrate the pl…