activity
19972025
most citedProduction and Integration of the ATLAS Insertable B-Layer

568 citations · 3.6k across the 110 of their papers we have counts for

collaborators

112 papers

physics.ins-det2025

X-ray Irradiation Studies on the Monopix DMAPS in 150nm and 180nm

Christian Bespin, Marlon Barbero, Pierre Barrillon +19

Monolithic active pixel sensors with depleted substrates present a promising option for pixel detectors in high-radiation environments. High-resistivity silicon substrates and high…

hep-ex2024★ 2 cited

Measurement of the branching fraction of the decay at Belle II

Belle II Collaboration, I. Adachi, L. Aggarwal +389

We measure the branching fraction of the decay using data collected with the Belle II detector. The data contain 387 million pairs produced i…

physics.ins-det2024

Cross talk of a large-scale depleted monolithic active pixel sensor (DMAPS) in 180 nm CMOS technology

Lars Schall, Christian Bespin, Ivan Caicedo +11

Monolithic pixel detectors combine readout electronics and sensor in a single entity of silicon, which simplifies the production procedure and lowers the material budget compared t…

physics.ins-det2023★ 5 cited

Charge collection and efficiency measurements of the TJ-Monopix2 DMAPS in 180nm CMOS technology

Christian Bespin, Ivan Caicedo, Jochen Dingfelder +10

Monolithic CMOS pixel detectors have emerged as competitive contenders in the field of high-energy particle physics detectors. By utilizing commercial processes they offer high-vol…

physics.ins-det2021

Characterization of passive CMOS sensors with RD53A pixel modules

Franz Glessgen, Malte Backhaus, Florencia Canelli +15

Both the current upgrades to accelerator-based HEP detectors (e.g. ATLAS, CMS) and also future projects (e.g. CEPC, FCC) feature large-area silicon-based tracking detectors. We are…

physics.ins-det2021★ 4 cited

Radiation tolerant, thin, passive CMOS sensors read out with the RD53A chip

Yannick Dieter, Michael Daas, Jochen Dingfelder +9

The radiation hardness of passive CMOS pixel sensors fabricated in 150 nm LFoundry technology is investigated. CMOS process lines are especially of interest for large-scale silicon…