activity
19982016
most citedElectrically-detected magnetic resonance in ion-implanted Si:P nanostructures

93 citations · 542 across the 13 of their papers we have counts for

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Showing cond-mat.mes-hallShow all

15 papers · 1 filter

cond-mat.mes-hall2016

From nanoscale to macroscale: applications of nanotechnology to production of bulk ultra-strong materials

Robert G. Clark

Carbon nanotubes have been famous since their discovery twenty years ago for their remarkable physical properties, from strength a hundred times higher than steel, to electrical cu…

cond-mat.mes-hall2009★ 57 cited

Electrostically defined few-electron double quantum dot in silicon

W. H. Lim, H. Huebl, L. H. Willems van Beveren +5

A few-electron double quantum dot was fabricated using metal-oxide-semiconductor(MOS)-compatible technology and low-temperature transport measurements were performed to study the e…

cond-mat.mes-hall2009★ 91 cited

Architecture for high-sensitivity single-shot readout and control of the electron spin of individual donors in silicon

A. Morello, C. C. Escott, H. Huebl +5

We describe a method to control and detect in single-shot the electron spin state of an individual donor in silicon with greatly enhanced sensitivity. A silicon-based Single-Electr…

cond-mat.mes-hall2008★ 7 cited

Bias spectroscopy and simultaneous SET charge state detection of Si:P double dots

M. Mitic, K. D. Petersson, M. C. Cassidy +7

We report a detailed study of low-temperature (mK) transport properties of a silicon double-dot system fabricated by phosphorous ion implantation. The device under study consists o…

cond-mat.mes-hall2006

Gate-controlled charge transfer in Si:P double quantum dots

F. E. Hudson, A. J. Ferguson, C. C. Escott +4

We present low temperature charge sensing measurements of nanoscale phosphorus-implanted double-dots in silicon. The implanted phosphorus forms two 50 nm diameter islands with sour…

cond-mat.mes-hall2006★ 20 cited

Ion implanted Si:P double-dot with gate tuneable interdot coupling

V. C. Chan, T. M. Buehler, A. J. Ferguson +6

We report on millikelvin charge sensing measurements of a silicon double-dot system fabricated by phosphorus ion implantation. An aluminum single-electron transistor (SET) is capac…