253 citations · 628 across the 7 of their papers we have counts for
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Progress toward superconductor electronics fabrication process with planarized NbN and NbN/Nb layers
Sergey K. Tolpygo, Justin L. Mallek, Vladimir Bolkhovsky +5
To increase density of superconductor digital and neuromorphic circuits by 10x and reach integration scale of Josephson junctions (JJs) per chip, we developed a new fabricat…
Wafer-Scale Characterization of a Superconductor Integrated Circuit Fabrication Process, Using a Cryogenic Wafer Prober
Joshua T. West, Arthur Kurlej, Alex Wynn +3
Using a fully automated cryogenic wafer prober, we measured superconductor fabrication process control monitors and simple integrated circuits on 200 mm wafers at 4.4 K, including…
Properties of Unshunted and Resistively Shunted Nb/AlOx-Al/Nb Josephson Junctions With Critical Current Densities from 0.1 mA/μm^2 to 1 mA/μm^2
Sergey K. Tolpygo, Vladimir Bolkhovsky, Scott Zarr +5
We investigated current-voltage characteristics of unshunted and externally shunted Josephson junctions (JJs) with high critical current densities, Jc, in order to extract their ba…
Advanced Fabrication Processes for Superconducting Very Large Scale Integrated Circuits
Sergey K. Tolpygo, Vladimir Bolkhovsky, T. J. Weir +4
We review the salient features of two advanced nodes of an 8-Nb-layer fully planarized process developed recently at MIT Lincoln Laboratory for fabricating Single Flux Quantum(SFQ)…
Fabrication Process and Properties of Fully-Planarized Deep-Submicron Nb/Al-AlOx/Nb Josephson Junctions for VLSI Circuits
Sergey K. Tolpygo, Vladimir Bolkhovsky, Terence J. Weir +3
A fabrication process for Nb/Al-AlOx/Nb Josephson junctions (JJs) with sizes down to 200 nm has been developed on a 200-mm-wafer tool set typical for CMOS foundry. This process is…
Inductance of Circuit Structures for MIT LL Superconductor Electronics Fabrication Process with 8 Niobium Layers
Sergey K. Tolpygo, Vladimir Bolkhovsky, T. J. Weir +4
Inductance of superconducting thin-film inductors and structures with linewidth down to 250 nm has been experimentally evaluated. The inductors include various striplines and micro…
Shadow evaporation of epitaxial Al/Al2O3/Al tunnel junctions on sapphire utilizing an inorganic bilayer mask
Paul B. Welander, Vladimir Bolkhovsky, Terence J. Weir +2
This letter describes a new inorganic shadow mask that has been employed for the evaporation of all-epitaxial Al/Al2O3/Al superconducting tunnel junctions. Organic resists that are…