activity
20112021
most citedElectrical characteristics of vertical-geometry Schottky junction to magnetic insulator (Ga,Mn)N heteroepitaxially grown on sapphire

9 citations · 19 across the 4 of their papers we have counts for

collaborators

7 papers

cond-mat.mtrl-sci20212 cited

Comparative study of magnetic properties of Mn magnetic clusters in GaN using classical and quantum mechanical approach

Yadhu Krishnan Edathumkandy, Dariusz Sztenkiel

Currently, simulations of many-body quantum systems are known to be computationally too demanding to be solved on classical computers. The main problem is that the computation time…

cond-mat.mtrl-sci2020

Crystal field model simulations of magnetic response of pairs, triplets and quartets of Mn ions in GaN

D. Sztenkiel, K. Gas, J. Z. Domagala +2

A ferromagnetic coupling between localized Mn spins was predicted in a series of \textit{ab initio} and tight binding calculations and experimentally verified for the dilute magnet…

cond-mat.mtrl-sci2019

Heavy-hole band splitting observed in mobility spectrum of p-type InAs grown on GaAs substrate

Jaroslaw Wrobel, Gilberto Umana-Membreno, Jacek Boguski +6

High quality berylium doped InAs layer grown by MBE on GaAs substrate has been examined via magnetotransport measurements and high resolution quantitative mobility spectrum analysi…

physics.app-ph20199 cited

Electrical characteristics of vertical-geometry Schottky junction to magnetic insulator (Ga,Mn)N heteroepitaxially grown on sapphire

Karolina Kalbarczyk, Krzysztof Dybko, Katarzyna Gas +7

Schottky barrier height and the ideality factor are established for the first time in the single phase (Ga,Mn)N using a vertical geometry device. The material has been heteroep…

cond-mat.mtrl-sci2018

Impact of substrate temperature on magnetic properties of plasma-assisted molecular beam epitaxy grown (Ga,Mn)N

Katarzyna Gas, Jaroslaw Z. Domagala, Rafal Jakiela +12

A range of high quality Ga1-xMnxN layers have been grown by molecular beam epitaxy with manganese concentration 0.2 < x < 10%, having the x value tuned by changing the growth tempe…

cond-mat.mtrl-sci20114 cited

Properties and characterization of ALD grown dielectric oxides for MIS structures

S. Gieraltowska, D. Sztenkiel, E. Guziewicz +7

We report on an extensive structural and electrical characterization of under-gate dielectric oxide insulators Al2O3 and HfO2 grown by Atomic Layer Deposition (ALD). We elaborate t…