2 papers
cs.AI2024
Differentiable Edge-based OPC
Guojin Chen, Haoyu Yang, Haoxing Ren +2
Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based…
cs.LG2024
ILILT: Implicit Learning of Inverse Lithography Technologies
Haoyu Yang, Haoxing Ren
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography syst…