31 citations · 89 across the 13 of their papers we have counts for
13 papers
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields
Guojin Chen, Zehua Pei, Haoyu Yang +3
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates…
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition
Guojin Chen, Haoyu Yang, Bei Yu
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of…
An Adversarial Active Sampling-based Data Augmentation Framework for Manufacturable Chip Design
Mingjie Liu, Haoyu Yang, Zongyi Li +7
Lithography modeling is a crucial problem in chip design to ensure a chip design mask is manufacturable. It requires rigorous simulations of optical and chemical models that are co…
Large Scale Mask Optimization Via Convolutional Fourier Neural Operator and Litho-Guided Self Training
Haoyu Yang, Zongyi Li, Kumara Sastry +5
Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability…
Generic Lithography Modeling with Dual-band Optics-Inspired Neural Networks
Haoyu Yang, Zongyi Li, Kumara Sastry +6
Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models…
Machine Learning for Electronic Design Automation: A Survey
Guyue Huang, Jingbo Hu, Yifan He +13
With the down-scaling of CMOS technology, the design complexity of very large-scale integrated (VLSI) is increasing. Although the application of machine learning (ML) techniques in…
Routing Towards Discriminative Power of Class Capsules
Haoyu Yang, Shuhe Li, Bei Yu
Capsule networks are recently proposed as an alternative to modern neural network architectures. Neurons are replaced with capsule units that represent specific features or entitie…
DAMO: Deep Agile Mask Optimization for Full Chip Scale
Guojin Chen, Wanli Chen, Yuzhe Ma +2
Continuous scaling of the VLSI system leaves a great challenge on manufacturing and optical proximity correction (OPC) is widely applied in conventional design flow for manufactura…
Attacking Split Manufacturing from a Deep Learning Perspective
Haocheng Li, Satwik Patnaik, Abhrajit Sengupta +5
The notion of integrated circuit split manufacturing which delegates the front-end-of-line (FEOL) and back-end-of-line (BEOL) parts to different foundries, is to prevent overproduc…
VLSI Mask Optimization: From Shallow To Deep Learning
Haoyu Yang, Wei Zhong, Yuzhe Ma +4
VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation. Re…
Automatic Layout Generation with Applications in Machine Learning Engine Evaluation
Haoyu Yang, Wen Chen, Piyush Pathak +3
Machine learning-based lithography hotspot detection has been deeply studied recently, from varies feature extraction techniques to efficient learning models. It has been observed…
Are Adversarial Perturbations a Showstopper for ML-Based CAD? A Case Study on CNN-Based Lithographic Hotspot Detection
Kang Liu, Haoyu Yang, Yuzhe Ma +5
There is substantial interest in the use of machine learning (ML) based techniques throughout the electronic computer-aided design (CAD) flow, particularly those based on deep lear…
Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning
Haoyu Yang, Shuhe Li, Cyrus Tabery +2
Layout hotpot detection is one of the main steps in modern VLSI design. A typical hotspot detection flow is extremely time consuming due to the computationally expensive mask optim…