31 citations · 89 across the 13 of their papers we have counts for
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cs.LG2022★ 2 cited
An Adversarial Active Sampling-based Data Augmentation Framework for Manufacturable Chip Design
Mingjie Liu, Haoyu Yang, Zongyi Li +7
Lithography modeling is a crucial problem in chip design to ensure a chip design mask is manufacturable. It requires rigorous simulations of optical and chemical models that are co…
cs.LG2022★ 3 cited
Large Scale Mask Optimization Via Convolutional Fourier Neural Operator and Litho-Guided Self Training
Haoyu Yang, Zongyi Li, Kumara Sastry +5
Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability…
cs.OH2022
Generic Lithography Modeling with Dual-band Optics-Inspired Neural Networks
Haoyu Yang, Zongyi Li, Kumara Sastry +6
Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models…