5 papers · 1 filter
GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation
Haoyu Yang, Haoxing Ren
Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of fre…
Differentiable Edge-based OPC
Guojin Chen, Haoyu Yang, Haoxing Ren +2
Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based…
Intelligent OPC Engineer Assistant for Semiconductor Manufacturing
Guojin Chen, Haoyu Yang, Bei Yu +1
Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development…
ILILT: Implicit Learning of Inverse Lithography Technologies
Haoyu Yang, Haoxing Ren
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography syst…
Optimizing Predictive AI in Physical Design Flows with Mini Pixel Batch Gradient Descent
Haoyu Yang, Anthony Agnesina, Haoxing Ren
Exploding predictive AI has enabled fast yet effective evaluation and decision-making in modern chip physical design flows. State-of-the-art frameworks typically include the object…